Cleaning and qualification processes
efficient pre-cleaning step for base cleanliness
Pre-cleaning
- Manual cleaning
- Immersion bath system in which impurities are mechanically removed by ultrasonic wave
- Our pre-cleaning system is a two-bath set-up. First an aqueous alkaline cleaning agent is sprayed onto the parts and then impurities are rinsed of the surface using DI water. The system is automated but can also be operated manually.
High-purity wet cleaning with innovative technologies
Wet cleaning system
- Wet cleaning system with two cleaning chambers, one cleaning tank and four rinsing tanks with the following available functions:
- Soaking, flooding, spraying, ultrasound
- CNp® “alternating pressure process”, in which impurities are removed by cavitation bubbles
- Drying by blow drying, infrared emitters, via CNp® and
Vacuum drying
The cyclic nucleation process (CNp®) technology® is a patented vacuum flood cleaning process that is particularly suitable for cleaning complex inside geometries.
Precise cleaning techniques for maximum cleanliness
Bakeout
- Bakeout in a vacuum chamber up to 150 °C to remove filmic contamination such as volatile and non-volatile hydrocarbon compounds as well as residual moisture.
- Residual hydrocarbons and moisture are evaporated from the component in a vacuum
Defined cleanliness outcomes
High end cleanliness
We offer four standardized cleaning stages for sizes up to 1,280 x 570 x 490 mm and 1,280 x 800 x 200 mm:
| LR0 | LR1 | LR2 | LR3 | ||
|---|---|---|---|---|---|
|
Particle ORK Particle SCP |
Gem. VDI 2083
Gem. ISO 14644 |
ORK100
SCP 6 |
ORK10
SCP 5 |
ORK1
SCP 4 |
ORK1
SCP 4 |
|
Filmische Reinheit
SCC gem. ISO 14644 |
Wasser |
Klasse -8 |
Klasse -10 |
Klasse -10 |
Klasse -12 |
|
Leicht flüchtige
Kohlenwasserstoffe |
Klasse -8 |
Klasse -10 |
Klasse -10 |
Klasse -12 |
|
|
Schwer flüchtige Kohlenwasserstoffe |
Klasse -8 |
Klasse -10 |
Klasse -10 |
Klasse -12 |
|
|
Reinraumklasse |
|
|
ISO 8 |
ISO 5 |
ISO 5 |
|
RGA |
|
Nein |
Nein |
Nein |
Ja |
|
Verpackung |
|
Einfach |
Doppelt |
Mehrfach* |
Mehrfach* |
|
Verfahren |
|
Vorreinigung |
Spritzen, Tauchen, Blastrocknen |
Spritzen, Tauchen, Ultraschall, CNp®, Infrarot- und Vakuum-trocknen, Trockenreinigung |
Spritzen, Tauchen, Ultraschall, CNp®, Infrarot- und Vakuum-trocknen, Trockenreinigung |
|
Bemerkung |
|
Öl- und fettfrei |
Reinraumtauglich |
Ausgas- und partikelarm |
Halbleiter- und hochsensible
Anwendungen |
*After voting